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SUMMARY:Templated self-assembly of Block Copolymers and Multiferroic Oxide
  Nanocomposites - Caroline A Ross\, Department of Materials Science and En
 gineering\, Massachusetts Institute of Technology\, Cambridge MA 02139\, U
 SA
DTSTART:20140324T150000Z
DTEND:20140324T160000Z
UID:TALK51519@talks.cam.ac.uk
CONTACT:37193
DESCRIPTION:Templating of the locations and orientations of self-assembled
  features is key to enabling a range of nanoscale processes and devices. W
 e discuss here the directed self assembly of two very different thin film 
 systems: vertical epitaxial oxide nanocomposites and block copolymers. Thi
 s illustrates the science underpinning the design of templates based on th
 eir interactions and commensurability with the self-assembling system. \nC
 odeposition of immiscible oxides on a single crystal substrate can produce
  two-phase nanocomposite films in which each phase grows epitaxially on th
 e substrate\, forming columnar structures with well-defined vertical inter
 faces. The periodicity of the pillars is determined by kinetic factors inc
 luding surface diffusivity and the flux of deposited material. We describe
  the templated self-assembly of spinel/perovskite (Co\, Ni or Mg)Fe2O4/BiF
 eO3 nanocomposites to form both periodic and aperiodic arrangements with p
 eriod of ~40 nm and above\, directed by substrate pits made by focussed io
 n beam or etching\, and the resulting properties of the nanocomposite. \nI
 n contrast\, block copolymers microphase separate with a characteristic pe
 riodicity governed by the length of the polymer chains\, producing pattern
 s useful for next generation nanolithography. Templating strategies based 
 on substrate topography are used to make complex arrangements of dots\, li
 nes and spaces and 3D cross-point structures from diblock copolymers or to
  form arrays of square-symmetry and Archimedean tiling patterns from linea
 r or star triblock terpolymers\, accomplished by solvent and solvothermal 
 annealing for processing times from seconds to hours. The resulting patter
 ns can be used as masks to fabricate various nanoscale devices.\n
LOCATION:Small Lecture Theatre (Bragg Building)\, Cavendish Laboratory
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